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10th International Conference on Reactive Sputter Deposition, RSD 2011
PROGRAM NOW AVAILABLE
MAPS AVAILABLE
RSD was established in Ghent in the year 2000. The Symposium has developed to an annual tradition, steadily growing without losing its focus on reactive sputtering and its fundamental aspects. The RSD rotates between its birth town of Ghent (every other year) and other locations, previously Delft (NL), Leoben (AU), and Manchester (UK), and is typically attended by ~100 participants.
Plenary Speaker
Peter Sigmund, University of Southern Denmark
"My fifty years with sputtering"
Invited Speakers
Ludvik Martinu, EcolePolytechnique Montréal, Canada
“Dynamics of reactive sputtering discharges studied by time- and space-resolved optical emission spectroscopy and fast imaging”
Session Fundamentals of Reactive Sputtering
Jaroslav Vlcek, University of West Bohemia, CZ
”HiPIMS modeling”
Session Ionized PVD/HIPP-processes
(COST action MP0804)
Denis Kurapov, Oerlikon-Balzers, LI
“Reactive PVD of aluminum oxide”
Session Industrial Research
Yutao Pei, University of Groningen, NL
“Dynamic roughening to dynamic smoothing: the growth behavior of reactively sputtered nanocomposite carbon based films”
Session Growth of Nanomaterials and -coatings
Important dates
Abstract submission deadline: October 1, 2011
Author notification: October 13, 2011
Registration deadline (presenting authors): November 1, 2011
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Gold sponsor
Organized by
The Swedish Vacuum Society
in cooperation with
Plasma & Coatings Physics
Thin Film Physics
Nanostructured materials
at
Linköping University |